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Development of a Nb/Al technology for SNS Josephson junctions

Academic Article
Publication Date:
2000
abstract:
We report here the status of development of our Nb/Al/Nb SNS Josephson junctions to be used as superconducting D/A converters. The electrical behaviour and the morphology of these Nb/Al/Nb junctions are strongly dependent on the deposition rate of the AL barrier. Junctions fabricated at a high rate of 5 nm/s have stable and reproducible properties. A possible interpretation of the effect of the Al morphology on the electrical behaviour of the junctions is given.
Iris type:
01.01 Articolo in rivista
Keywords:
Josephson junction; SNS junction; thin film technology
List of contributors:
Maggi, Sabino
Authors of the University:
MAGGI SABINO
Handle:
https://iris.cnr.it/handle/20.500.14243/325210
Published in:
INTERNATIONAL JOURNAL OF MODERN PHYSICS B
Journal
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URL

http://www.worldscientific.com/doi/abs/10.1142/S0217979200003289
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