Publication Date:
2014
abstract:
We report about the realization of a negative-tone photoresist for two-photon lithography containing superparamagnetic iron-oxide nanoparticles at 0.1 wt.% concentration. The material was characterized in terms of optical transparence in the visible spectral range and the microfabrication process engineered in order to minimize particles agglomeration. The versatility of two-photon direct laser writing allowed us to fabricate three-dimensional structures with sub-micrometer resolution, letting us envision possible applications of this nanocomposite blend for the realization of complex magnetically actuated MEMS.
Iris type:
04.01 Contributo in Atti di convegno
Keywords:
lithography; magnetic; nanoparticle
List of contributors: