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Volatile Ce-III hexafluoroacetylacetonate glyme adducts as promising precursors for the MOCVD of CeO2 thin films

Articolo
Data di Pubblicazione:
2000
Abstract:
Three novel monomeric glyme adducts of cerium hexafluoroacetylacetonate (Ce(hfa)3odiglyme 1, Ce(hfa)3odiethyldiglyme 2, and Ce(hfa)3odibutyldiglyme 3) have been synthesized adopting a one-pot procedure and characterized by elemental analyses, mass spectrometry, and infrared spectroscopy. Single-crystal X-ray diffraction (XRD) studies provide evidence of a mononuclear nine-coordinated complex with a monocapped square antiprismatic structure of the Ce(hfa)3odiglyme (monoclinic system, space group = P21/c; a = 10.037(2) Å, b = 15.643(5) Å, c = 21.080(5) Å, ? = 103.460(5)°, Z = 4). The thermal analyses of all three compounds revealed high volatility and good thermal stability with low residue. The adducts 1-3 have better mass transport properties and thermal behavior than conventional cerium metal-organic chemical vapor deposition (MOCVD) precursors, and have been successfully applied to CeO2 film depositions. The good quality of the deposited layers indicates that the adducts are very attractive precursors for MOCVD applications.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
adducts; cerium; MOCVD precursors; thin films
Elenco autori:
LO NIGRO, Raffaella
Autori di Ateneo:
LO NIGRO RAFFAELLA
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/173779
Pubblicato in:
CHEMICAL VAPOR DEPOSITION
Journal
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