Publication Date:
2020
abstract:
This article reports the first comprehensive analysis of the reliability of hydrogen-terminated diamond metal semiconductor field-effect transistors (MESFETs) submitted to OFF-state stress. We demonstrate that stress induces an increase in ON-resistance and a shift in the threshold voltage, along with a decrease in the transconductance peak value. These effects are ascribed to the generation of defects at the diamond surface and/or in the upper semiconductor layers. The defects are generated both in the access regions and under the gate, and their activation energy is 0.30 eV.
Iris type:
01.01 Articolo in rivista
Keywords:
Logic gates; Stress; Diamond; MESFETs; Semiconductor device measurement; Threshold voltage; Degradation; Deep levels; diamond; hydrogen termination; metal semiconductor field-effect transistor (MESFET); reliability
List of contributors:
Cannata', Domenico; DI PIETRANTONIO, Fabio
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