Analysis of the damage effect of femtosecond-laser irradiation on extreme ultraviolet Mo/Si multilayer coating
Articolo
Data di Pubblicazione:
2012
Abstract:
Damage analysis of Mo/Si multilayer coatings exposed to fs infrared laser irradiation has been performed. The Mo/Si a-periodic multilayer samples were specifically designed with wide reflectivity bandwidth and suitable phase chirp in order to reflect attosecond pulses. After irradiation, the mirror surface was analyzed by using an optical microscope and a profilometer. The stoichiometry of the compounds formed at the sample surface after the irradiation was investigated using X-Ray photoemission spectroscopy. The performances of the irradiated samples with the reflected pulse characteristics have been derived via reflectivity and phase measurements. © 2011 Elsevier B.V. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Attosecond physics; Extreme UV lithography; Laser damage; Multilayers
Elenco autori:
Nicolosi, Piergiorgio; Nisoli, Mauro; Pelizzo, MARIA GUGLIELMINA
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