Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 x 10(6) were measured at cryogenic temperatures, and in a Fabry-Perot cavity, where an optical finesse up to 50000 has been observed. (C) 2016 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).