Microplow-row lithography and fabrication of submicrometer magnetic structures

This letter describes the use of a microplow-row lithography technique to fabricate wire and dot arrays with submicrometer resolution. Fabrication of patterned magnetic structures with or without resist processing was demonstrated that shows the simplicity and the usefulness of this technique. The performance of the patterned magnetic structures compares favorably with that of similar fabrication by using conventional methods.