Data di Pubblicazione:
1999
Abstract:
A GeO2-SiO2 planar waveguide, activated with 1% mol Pr3+, has been prepared using a dip-coating technique. The GeO2-SiO2 film was deposited on a substrate consisting of a silicon wafer with a silica buffer layer. After annealing at 800 °C and 900 °C the waveguide luminescence and Raman spectra were measured. The Raman spectra show that complete densification is achieved after annealing at 800 °C. Analysis of the emission spectra and the decay curves from the 3P0 and 1D2 states of Pr3+ indicates that the non-radiative relaxation due to the rare-earth clustering is less important than in massive silica xerogels.
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Ferrari, Maurizio
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