Surface Functionalization of Nanostructured Fe2O3 Polymorphs: From Design to Light-Activated Applications
Academic Article
Publication Date:
2013
abstract:
Nanostructured iron(III) oxide deposits are grown by chemical vapor deposition (CVD) at 400-500 °C on Si(100) substrates from Fe(hfa)2TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N',N'-tetramethylethylenediamine), yielding the selective formation of ?-Fe2O3 or the scarcely studied ?-Fe2O3 polymorphs under suitably optimized preparative conditions. By using Ti(OPr(i))4 (OPr(i) = iso-propoxy) and water as atomic layer deposition (ALD) precursors, we subsequently functionalized the obtained materials at moderate temperatures (<300 °C) by an ultrathin titanomagnetite (Fe3-xTixO4) overlayer. An extensive multitechnique characterization, aimed at elucidating the system structure, morphology, composition and optical properties, evidenced that the photoactivated hydrophilic and photocatalytic behavior of the synthesized materials is dependent both on iron oxide phase composition and ALD surface modification. The proposed CVD/ALD hybrid synthetic approach candidates itself as a powerful tool for a variety of applications where semiconductor-based nanoarchitectures can benefit from the coupling with an ad hoc surface layer.
Iris type:
01.01 Articolo in rivista
Keywords:
chemical vapor deposition; atomic layer deposition; iron oxide; titanomagnetite; photoactivated properties
List of contributors:
Gasparotto, Alberto; Maccato, Chiara; Carraro, Giorgio; Barreca, Davide; Rossi, Francesca; Salviati, Giancarlo
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