X-ray waveguide as a new tool for 100 nm spatially resolved x-ray strain analysis

In this work we present the results of a residual strain analysis performed on LOGOS processed films by means of x-ray reciprocal space mapping. Our findings demonstrate the possibility of achieving a sub-micrometre spatial resolution by using an x-ray waveguide as an innovative optical element in the measurement configuration. The entire set-up, working as a projection microscope, can be schematically described as waveguide, sample and CCD camera. In order to derive a quantitative description of the strain field induced in the Si wafer by the 1 mum wide SiO2 stripes, we performed data analysis by dynamical simulation of the x-ray diffraction profiles based on an analytical treatment of the elastic field.