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Nanostructuring methylammonium lead iodide perovskite by ultrafast nano imprinting lithography

Academic Article
Publication Date:
2017
abstract:
We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100 nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films.
Iris type:
01.01 Articolo in rivista
Keywords:
Interference lithography; Nanostructures; Perovskite; Photovoltaic; Ultrafast NIL
List of contributors:
Sonato, Agnese; Zanut, Alessandra; Cefarin, Nicola; Suran, Fabio; Tormen, Massimo
Authors of the University:
TORMEN MASSIMO
Handle:
https://iris.cnr.it/handle/20.500.14243/346159
Published in:
MICROELECTRONIC ENGINEERING
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http://www.scopus.com/inward/record.url?eid=2-s2.0-85015662331&partnerID=q2rCbXpz
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