Spectrally resolved cathodoluminescence determination of dopant diffusion in InP/InGaAsP based multi quantum well Rabry-Perot lasers

Low temperature monochromatic cathodoluminescence (CL) spectral analyses and imaging were used to determine the widths of resistive regions (due to Fe diffusion) in multi-quantum-well (MQW) InP-based laser devices and to detect the different amount of damage induced by alternative In-situ Etching (ISE) and Reactive Ion Etching (RIE) techniques. The widths of the resistive regions were estimated by comparing the 5 K CL emission width from the MQW and the actual width as obtained by SEM investigations. Monochromatic CL also did not reveal any emission from the InP:Sn layer between semi-insulating material (Fe-doped LnP) and p-type layer (Zn-doped InP), indicating interdiffusion of Fe and Zn laterally the MQW, and the presence of substantial Sn diffusion (up to 2500 nanometers) into the substrate.