Sensitivity to DNA-damaging agents and mutation induction by UV light in UV-sensitive CHO cells.
Academic Article
Publication Date:
1986
abstract:
Three UV-sensitive (UVs) mutants isolated from a CHO cell line were analyzed for survival after exposure to H2O2, EMS, MMC, CCNU, X-rays and for mutation induction after UV-irradiation. The UVs mutants showed normal sensitivities to EMS and H2O2, whereas they were hypersensitive to the bifunctional alkylating agents MMC and CCNU and to hypoxic X-irradiation. Compared to parental cells, one of the UV-sensitive clones showed approximately 3- and 7-fold enhancement in the mutagenic response per unit UV dose for 6-thioguanine and ouabain resistance, respectively.
Iris type:
01.01 Articolo in rivista
Keywords:
DNA reapir mutant; CHO; UV sensitivity; DNA damaging agent; nucleotide excision repair
List of contributors:
Stefanini, Miria; Mondello, Chiara
Published in: