Thickness determination of ceramic thin films by X-ray absorption analysis

In order to obtain a rapid and non-destructive method for the evaluation of the thickness of polycrystalline thin films of TiO2 or Ga2O3 deposited on alumina substrates, a procedure based on X-ray absorption, and employing X-ray diffraction at glancing angles, was optimized. The results were compared with SEM observations and an agreement within 25% was obtained.