B-doping in Ge by excimer laser annealing

An experimental and theoretical study of the effect of excimer laser annealing (ELA) on B redistribution and electrical activation in Ge is reported. We performed detailed structural, chemical, and electrical characterizations of Ge samples implanted with B (20 keV, 1 x 10 15, or 1 x 10(16) B/cm(2)) and processed by ELA (lambda = 308 nm) with multiple pulses (1, 3, or 10). We also developed a diffusion model, in order to simulate the B redistribution induced by the ELA process. We found an anomalous impurity redistribution in the molten phase, which causes a dopant incorporation during the melt-growth at the maximum melt depth. The investigated samples showed a partial electrical activation of the B dopant. The inactivation of B in the samples implanted with 1 x 10(15) B/cm(2) was correlated to an oxygen contamination, while the poor electrical activation of B in the samples implanted with 1 x 10(16) B/cm(2) was related to the precipitation of the dopant, in good agreement with the experimental and theoretical results.