Data di Pubblicazione:
2009
Abstract:
Silicon-rich SiGe alloys represent a promising platform for the development of large-area single-mode optical waveguides to be integrated in silicon-based optical circuits. We find that SiGe layers epitaxially grown on Si successfully guide radiation with a 1.55 mu m wavelength, but, beyond a critical core thickness, their optical properties are strongly affected by the clustering of misfit dislocations at the interface between Si and SiGe, leading to a significant perturbation of the local refractive index. Transmission electron microscopy and micro-Raman spectroscopy, together with finite-element simulations, provide a complete analysis of the impact of dislocations on optical propagation. (C) 2009 Elsevier B.V. All rights reserved.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Silicon photonics; Silicon-germanium waveguides; Misfit dislocations
Elenco autori:
Bragheri, Francesca
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