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STUDY OF SIF4-N2-H2 PLASMAS FOR THE DEPOSITION OF FLUORINATED SILICON-NITRIDE FILMS
Academic Article
Publication Date:
1993
Iris type:
01.01 Articolo in rivista
List of contributors:
Losurdo, Maria
Handle:
https://iris.cnr.it/handle/20.500.14243/7629
Published in:
MATERIALS RESEARCH SOCIETY SYMPOSIA PROCEEDINGS
Journal
