MOCVD of Cr-based coatings using Cr(NEt2)4 as single source precursor

Chromium carbo-nitride coatings with low nitrogen contents have been deposited by low pressure MOCVD using Cr(NEt2)4 as single source precursor. Depositions were carried out in the temperature range 300-520°C either under high vacuum without carrier gas or using a partial pressure of nitrogen or hydrogen as carrier gas. All the films are X-ray amorphous and they exhibit a uniform and specular surface morphology with a metallic shiny aspect. The major volatile by-products were analyzed and a decomposition mechanism is proposed. Preliminary properties of these films are also reported.