Publication Date:
1998
abstract:
MoO3-Bi2O3 thin films are grown by CVD on SiO2/Si(100) and Al2O3 using BiPh3 and MoO2(dpm)2 as precursors. The composition,
microstructure and morphology of the samples can be suitably controlled by the proper combination of synthesis and thermal treatment
conditions. The chemical characterization of the obtained films is carried out by XPS and FTIR, while the microstructure and surface
morphology are investigated respectively by XRD and AFM. Preliminary measurements on Bi-doped MoO3 films indicate that they could be
used for the detection of scarcely reducing gases.
Iris type:
01.01 Articolo in rivista
Keywords:
Bismuth oxide; Molybdemum oxide; Bismuth molybdates; Thin films; Chemical vapour deposition
List of contributors:
Barreca, Davide
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