Method of Determination of Overall Reaction Rates by Mass Spectrometry of Stable Molecules during Plasma Processing of Layers

Method of determination of reaction rates based on the use of overall chemical resctions and on mass spectrometry of stable molecules is described. Two possible ways of the conversion of mass spectrometry data (ion currents) into partial fluxes are proposed. The application of overall reaction descripion of plasma chemistry is illustrated for two widely used gas mixtures: CF4/O2 and SiF4/H2. The relative importance of homogeneous and heterogeneous reactions can be distinguished by the method introduced.