A study of suppression effect of oxygen contamination by bias voltage in reactively sputtered ZrN films

Academic Article
Publication Date:
2012
abstract:
[object Object]
Iris type:
01.01 Articolo in rivista
Keywords:
Oxygen contamination; R. F. sputtering magnetron; Zirconium nitride
List of contributors:
Authors of the University:
Handle:
https://iris.cnr.it/handle/20.500.14243/282353
Published in:
SURFACE & COATINGS TECHNOLOGY
Journal