Data di Pubblicazione:
1999
Abstract:
TEM and SIMS analyses of InP submitted to single and double implantation have allowed to
establish that the end of range (EOR) dislocation loops, mostly of the Frank type, are efficient
gettering sites for the implanted Fe dopant. The gettering rate increases with increasing annealing
temperature, due to both increased Fe mobility and loop coarsening. Besides the EOR loops, other
extended defects, e.g. the tangled networks of dislocations at the interfaces of bands of twins, are
seen to getter Fe. Such gettering strongly affects the diffusion of Fe upon annealing.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
InP; Fe; implantation; SIMS; TEM
Elenco autori:
Frigeri, Cesare; Rossetto, GILBERTO LUCIO
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