Quantifying inhomogeneities in silicon-rich oxide thin films

Academic Article
Publication Date:
2013
abstract:
Spectroscopic techniques can be used to estimate structural inhomogeneities in silicon oxide thin films.
Iris type:
01.01 Articolo in rivista
Keywords:
SiOx; TOF-ERDA; EDX; XPS; IR absorption; ellipsometry
List of contributors:
Handle:
https://iris.cnr.it/handle/20.500.14243/179707
Published in:
SPIE NEWSROOM
Journal