Plasma radiofrequency discharges as cleaning technique for the removal of C-W coatings
Academic Article
Publication Date:
2013
abstract:
Erosion of materials by chemical and physical
sputtering is one of the most concern of plasma wall
interaction in tokamaks. In divertor ITER-like tokamaks,
where carbon and tungsten are planned to be used,
hydrogenated C-W mixed compounds are expected to
form by erosion, transport and re-deposition processes.
The selection of these materials as divertor components
involves lifetime and safety issues due to tritium retention
in carbon co-deposits. In this paper a cleaning technique
based on RF (13.56 MHz) capacitively coupled H2/Ar
plasmas has been used to remove C-W mixed materials
from test specimens. The dependence of the removal rate
on the H2/Ar ratio and on the plasma pressure has been
investigated by X-ray photoelectron spectroscopy, atomic
force microscopy, profilometry as regards the solid phase
and by Langmuir probe and optical emission spectroscopy
as regards the plasma phase. The best result has been
obtained with a H2/Ar ratio of 10/90 at a pressure of 1 Pa.
An explanation based on a synergistic effect between
physical sputtering due to energetic ions and chemical
etching due to radicals, together with the pressure dependence
of the ion energy distribution function, is given.
Iris type:
01.01 Articolo in rivista
Keywords:
C-W mixed materials; Film removal; Erosion rate; RF capacitively coupled plasmas
List of contributors:
Laguardia, Laura; Caniello, Roberto; Vassallo, Espedito; Grosso, GIOVANNI MARIA; Ghezzi, FRANCESCO MAURO; Cremona, Anna
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