Synthesis and characterization of methylcyclopentadienyl-(eta(3)-allyl)platinum and its use as a metallo-organic chemical vapour deposition precursor of platinum

This communication reports on rapid, efficient synthesis of the metal-organic chemical vapor deposition (MOCVD) precursor (methylcyclopentadienyl)allylplatinum. The compound is shown to be an effective precursor for the deposition of platinum thin films giving deposits of high quality and purity, probably due to the nature of ligands which seems to be good leaving groups as confirmed by mass spectrometric pathway.