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Crystalline ZnO/SrTiO3 transparent field effect transistor

Academic Article
Publication Date:
2008
abstract:
We fabricated field effect transistors which are transparent at visible wavelength, by realizing epitaxial ZnO/SrTiO3 heterostructures. High crystalline quality ZnO layers were grown by pulsed laser deposition on 110 oriented strontium titanate single crystals. By conventional photolithographic techniques we realized micrometric sized devices in both bottom-gate stacked layers geometry and planar side-gate configuration. Our transistors show 80% light transmittance, on/off ratios up to 10(6) and field effect mobilities up to 30 cm(2)/Vs at 77 K. (c) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Iris type:
01.01 Articolo in rivista
Keywords:
THIN-FILM TRANSISTORS; PULSED-LASER DEPOSITION; ZNO; FABRICATION; MOBILITY
List of contributors:
Marre', Daniele; Siri, Antonio; Biasotti, Michele; Canu, Giovanna; Pellegrino, Luca; Vignolo, Maurizio; Pallecchi, Ilaria; Bellingeri, Emilio
Authors of the University:
BELLINGERI EMILIO
CANU GIOVANNA
PALLECCHI ILARIA
PELLEGRINO LUCA
VIGNOLO MAURIZIO
Handle:
https://iris.cnr.it/handle/20.500.14243/158291
Published in:
PHYSICA STATUS SOLIDI. A, APPLICATIONS AND MATERIALS SCIENCE (PRINT)
Journal
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