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Doping in silicon nanocrystals

Academic Article
Publication Date:
2007
abstract:
The absorption and, for the first time, the emission spectra of doped silicon nanocrystals have been calculated within a first-principles framework including geometry optimization. Starting from hydrogenated silicon nanocrystals, simultaneous n- and p-type doping with boron and phosphorous impurities have been considered. We found that the B-P co-doping results to be easier than simple 13- or P-doping and that the two impurities tend to occupy nearest neighbours sites inside the nanocrystal itself. The co-doped nanocrystals bandstructure presents band edge states that are localized on the impurities and are responsible of the red-shifted absorption threshold with respect to that of pure un-doped nanocrystals in fair agreement with the experimental outcorne. The emission spectra show a Stokes shift with respect to the absorption due to the structural relaxation after the creation of the electron-hole pair. Moreover, the absorption and emission spectra have been calculated for a small co-doped nanocrystal beyond the single particle approach by introducing the self-energy correction and solving the Bethe-Salpeter equation scheme. Our procedure shows the important role played by the many-body effects. (C) 2006 Elsevier B.V. All rights reserved.
Iris type:
01.01 Articolo in rivista
Keywords:
Excitation spectra calculations; Many-body and quasi-particle theory; Silicon; Nanostructures; Doping
List of contributors:
Ossicini, Stefano; Ninno, Domenico; Cantele, Giovanni; Magri, Rita; Degoli, Elena
Authors of the University:
CANTELE GIOVANNI
Handle:
https://iris.cnr.it/handle/20.500.14243/158216
Published in:
SURFACE SCIENCE
Journal
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URL

http://www.sciencedirect.com/science/article/pii/S0039602806013173
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