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A study of nanocrystallinity in nc-Si, nc-Si:C, nc-Si:Ge films deposited by PECVD
Conference Paper
Publication Date:
2005
Iris type:
04.01 Contributo in Atti di convegno
List of contributors:
Capezzuto, Pio; Losurdo, Maria; Bruno, Giovanni
Handle:
https://iris.cnr.it/handle/20.500.14243/53829
