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MOVPE growth and characterisation of ZnTe epilayers on (100)ZnTe : P substrates

Articolo
Data di Pubblicazione:
2003
Abstract:
The growth of ZnTe by atmospheric pressure metalorganic vapour phase epitaxy on (1 0 0)ZnTe:P substrates is reported. The epilayers were grown at 340degreesC after in situ H, heat cleaning of the substrate for surface oxide removal. Secondary ion mass spectrometry analysis of as-grown samples has shown that in situ treatment temperatures above 240degreesC are necessary. Moreover, no phosphorous incorporation occurs in the epilayers by either diffusion from the substrate or auto-doping through the vapour. Carbon is instead incorporated in the epilayers at concentrations higher than in the substrate. 4.2 K photoluminescence (PL) measurements shock a dominant band edge emission, whose main component at 2.3809 eV is identified. by comparison with reflectance spectra, with the Is-state free exciton line. its FWHM being 2.2 meV. A weak 2s-state exciton line also appears on the high-energy side of the ground-state emission. further confirming the high optical quality and purity of the epilayers. Donor and acceptor bound exciton lines are also identified within the band edge region, whilst free-to-bound and donor-acceptor pair bands below 2.37 eV in the PL spectra are ascribed to luminescence from the substrate.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Homoepitaxy;Impurities;Metalorganic vapor phase epitaxy;ZnTe
Elenco autori:
Prete, Paola
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/437716
Pubblicato in:
JOURNAL OF CRYSTAL GROWTH
Journal
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