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Oxygen-activated epitaxial recrystallization of Li-implanted alpha-SiO2

Articolo
Data di Pubblicazione:
2000
Abstract:
A very strong exchange of oxygen between alpha-quartz (O-16) and annealing atmosphere (O-18) observed during solid-phase epitaxial growth of Li+- and Cs+-ion-beam-amorphized single-crystal alpha-quartz is reported. Epitaxial regrowth was observed in Li-irradiated samples after 700 degrees C annealing and in Cs-irradiated samples after 870 degrees C annealing, by means of Rutherford backscattering spectrometry in channeling geometry. The O-18/O-16 exchange and the outdiffusion of Li were investigated by the use of time-of-flight elastic recoil detection analysis. Our experiments show that alkali-ion implantation strongly enhances the exchange of O-16 in SiO2 with O-18 of the annealing atmosphere. The exchange accompanies the loss of alkali atoms, thus favoring the recrystallization of the lattice. Mechanisms of epitaxial regrowth in Li- and Cs-implanted alpha-quartz are discussed.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
alpha quartz; recrystallization; ion irradiation; Lithium ions
Elenco autori:
Roccaforte, Fabrizio
Autori di Ateneo:
ROCCAFORTE FABRIZIO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/409476
Pubblicato in:
PHYSICAL REVIEW. B, CONDENSED MATTER AND MATERIALS PHYSICS
Journal
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