Alterations of wheat root plasma membrane lipid composition induced by copper stress result in changed physicochemical properties of plasma membrane lipid vesicles
Academic Article
Publication Date:
2002
abstract:
A response when wheat is grown in excess copper is an altered lipid composition of the root plasma membrane (PM). With detailed characterisation of the root PM lipid composition of the copper-treated plants as a basis, in the present study, model systems were used to gain a wider understanding about membrane behaviour, and the impact of a changed lipid composition.
Iris type:
01.01 Articolo in rivista
Keywords:
wheat root; copper stress; plasma membrane; EPR; vesicle permeability
List of contributors:
Calucci, Lucia; Pinzino, Calogero
Published in: