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High-quality 5 GeV electron bunches with resonant multi-pulse ionization injection

Academic Article
Publication Date:
2020
abstract:
The production of high-quality electron bunches in laser wakefield acceleration relies on the possibility of injecting ultra-low emittance bunches in the plasma wave. A new bunch injection scheme (resonant multi-pulse ionization, ReMPI) has been conceived and studied, in which electrons extracted by ionization are trapped by a large-amplitude plasma wave driven by a train of resonant ultrashort pulses. Such a train of pulses can be obtained in a very efficient, compact and stable way, by phase manipulation in the laser front-end. The ReMPI injection scheme relies on currently available laser technology and is being considered for the implementation of future compact x-ray free electron laser schemes. Simulations show that high-quality electron bunches with an energy of up to 5 GeV and a peak current exceeding 2 kA, with normalized emittance of below 0.1 mm x mrad and a slice energy spread of below 0.1%, can be obtained with a single stage.
Iris type:
01.01 Articolo in rivista
Keywords:
laser-plasma acceleration; high-brightness beams; resonant multi-pulse ionization injection; multi-pulse laser wake field acceleration; free electron lasers; high-quality electron beams
List of contributors:
Gizzi, LEONIDA ANTONIO; Labate, LUCA UMBERTO; Koester, PETRA MARIA; Brandi, Fernando; Fulgentini, Lorenzo; Baffigi, Federica
Authors of the University:
BAFFIGI FEDERICA
BRANDI FERNANDO
FULGENTINI LORENZO
GIZZI LEONIDA ANTONIO
KOESTER PETRA MARIA
LABATE LUCA UMBERTO
Handle:
https://iris.cnr.it/handle/20.500.14243/397654
Published in:
PLASMA PHYSICS AND CONTROLLED FUSION (PRINT)
Journal
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