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SELECTIVE TRILAYER DEPOSITION PROCESS FOR FABRICATING Nb/Al-AlOx/Nb JOSEPHSON TUNNEL-JUNCTIONS

Articolo
Data di Pubblicazione:
1994
Abstract:
High quality Nb/Al-AlOx/Nb Josephson tunnel junctions have been fabricated using a novel process named the selective trilayer deposition process. The junction is formed on a patterned Nb underlayer through the lift-off deposition of a Nb/Al-AlOx/Nb trilayer. Anodization then provides the insulation between the underlayer and the wiring layer. We show that this easy and simple process is particularly advantageous for the fabrication of many vertically stacked tunnel junctions.
Tipologia CRIS:
01.01 Articolo in rivista
Elenco autori:
Monaco, Roberto
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/5142
Pubblicato in:
APPLIED PHYSICS LETTERS
Journal
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