Deposition of continuous diamond films onto molibdenum substrate by DC plasma CVD

Continuous diamond films have been grown by DC plasma CVD onto Mo substrates with a high growth rate (up to 60 mu m/h) from a gaseous mixture of methan and hydrogen. The obtained films have good crystallinity in the sense of X-ray diffraction, Raman spectroscopy, optical and scanning electron microscopy. The effect of varying independently the working parameters on the material properties of the films has also been investigated. Preliminary results will be discussed.