Data di Pubblicazione:
2004
Abstract:
Self assembled monolayers (SAM) formed fromnonanethiols on thin gold
films were exposed to a beam of ground state and metastable neutral barium atoms
through a nickel mask. The interaction of the Ba atoms with the nonanethiol layer,
followed by an etching process, creates well defined structures on the gold film, with
features below 100 nm. We compared the interaction of ground state Ba atoms and
SAM molecules with respect to metastable Ba atoms, finding that by using metastable
atoms the Ba dose per SAM molecule is reduced. The results indicate that nanofabrication
in the nanometer range with barium atoms is feasible.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
lithography; nanodeposition; atomic beam
Elenco autori:
Fioretti, Andrea; Gozzini, Silvia; Gabbanini, Carlo
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