Publication Date:
2018
abstract:
We demonstrate modulated H-2 and O-2 plasma treatments as an effective methodology for controlled chemical functionalization by hydrogen and oxygen atoms of single-and multi-layer chemical vapor deposition (CVD) graphene aiming at engineering material properties. The effects of the functionalization degree on the optical and transport properties of graphene are discussed with a twofold aim of (i) providing reproducible experimental protocols for tailoring graphene properties, and of (ii) providing insights into the chemical mechanisms involved in the plasma-processing of graphene with hydrogen and oxygen atoms.
Iris type:
01.01 Articolo in rivista
Keywords:
Graphene; plasma treatment; Chemical Vapor Deposition
List of contributors:
Bianco, GIUSEPPE VALERIO; Ingrosso, Chiara
Published in: