Publication Date:
2015
abstract:
In this work we focus on P doping of Si nanocrystals (NCs) embedded in a SiO2 matrix. We prove that, at equilibrium, high P concentrations within the Si NCs are thermodynamically favoured. We experimentally estimate the energy barriers for P diffusion in SiO2 and trapping/de-trapping at the SiO2/Si NCs interface, obtaining a complete picture of the system at equilibrium.
Iris type:
04.01 Contributo in Atti di convegno
Keywords:
doping; silicon; nanostructures; diffusion
List of contributors: