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Thermodynamic stability of high phosphorus concentration in silicon nanostructures

Conference Paper
Publication Date:
2015
abstract:
In this work we focus on P doping of Si nanocrystals (NCs) embedded in a SiO2 matrix. We prove that, at equilibrium, high P concentrations within the Si NCs are thermodynamically favoured. We experimentally estimate the energy barriers for P diffusion in SiO2 and trapping/de-trapping at the SiO2/Si NCs interface, obtaining a complete picture of the system at equilibrium.
Iris type:
04.01 Contributo in Atti di convegno
Keywords:
doping; silicon; nanostructures; diffusion
List of contributors:
Napolitani, Enrico; Perego, Michele; Scuderi, Mario
Authors of the University:
PEREGO MICHELE
SCUDERI MARIO
Handle:
https://iris.cnr.it/handle/20.500.14243/405432
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