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Assessing the performance of two-dimensional dopant profiling techniques

Academic Article
Publication Date:
2004
abstract:
This article discusses the results obtained from an extensive comparison set up between nine different European laboratories using different two-dimensional (2D) dopant profiling techniques (SCM, SSRM, KPFM, SEM, and electron holography). This study was done within the framework of a European project (HERCULAS), which is focused on the improvement of 2D-profiling tools. Different structures (staircase calibration samples, bipolar transistor, junctions) were used. By comparing the results for the different techniques, more insight is achieved into their strong and weak points and progress is made for each of these techniques concerning sample preparation, dynamic range, junction delineation, modeling, and quantification. Similar results were achieved for similar techniques. However, when comparing the results achieved with different techniques differences are noted.
Iris type:
01.01 Articolo in rivista
Keywords:
Scanning capacitance microscopy; Scanning spreading resistance microscopy; Transmission electron microscopy; semiconductors
List of contributors:
Raineri, Vito; Giannazzo, Filippo
Authors of the University:
GIANNAZZO FILIPPO
Handle:
https://iris.cnr.it/handle/20.500.14243/41628
Published in:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. B
Journal
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