X-RAY PHOTOEMISSION AND AUGER-SPECTRA OF DAMAGE INDUCED BY AR+-ION ETCHING AT SIO2 SURFACES
Academic Article
Publication Date:
1987
abstract:
XPS study of argon ion induced chemical reduction of silica surfaces
Iris type:
01.01 Articolo in rivista
Keywords:
XPS; silica; Ar ion etching
List of contributors:
Paparazzo, Ernesto
Published in: