Thermal redistribution of iron implanted in Czochralski silicon

Different doses of iron ions were implanted in Czochralski grown single-crystal silicon samples and subsequently annealed at 1000°C for 2 h in a dry nitrogen atmosphere. The behavior of the implanted iron and of oxygen already present in the material was monitored. It was found that the existence of the remaining structural disorder after the annealing treatment plays a dominant role in iron and oxygen segregation into the disordered region. This confirms the theory which predicts that the structural disorder and related strain fields are dominant mechanisms for gettering of metallic ions.