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Graphene schottky junction on pillar patterned silicon substrate

Articolo
Data di Pubblicazione:
2019
Abstract:
A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly biasand temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector. © 2019 by the authors.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
.
Elenco autori:
DI BARTOLOMEO, Antonio; Iemmo, Laura; Luongo, Giuseppe; Giubileo, Filippo
Autori di Ateneo:
GIUBILEO FILIPPO
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/386790
Pubblicato in:
NANOMATERIALS
Journal
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https://www.scopus.com/record/display.uri?eid=2-s2.0-85066938513&origin=inward&txGid=e7c75f6c02f036f26646b6357f1a2fb5#
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