Parametrization of Optical Properties of Indium-Tin-Oxide Thin Films by Spectroscopic Spectroscopic Ellipsometry: Substrate Interfacial Reactivity
Articolo
Data di Pubblicazione:
2002
Abstract:
Indiumtinoxide,ITO, films deposited by sputtering and e-gun
evaporation on both transparent Corning glass! and opaque (c-Si, c-
Si/SiO2) substrates and in c-Si/a-Si:H/ITO heterostructures have been
analyzed by spectroscopic ellipsometry,SE, in the range 1.55.0 eV. Taking
the SE advantage of being applicable to absorbent substrate, ellipsometry
is used to determine the spectra of the refractive index and extinction
coefficient of the ITO films. The effect of the substrate surface on the
ITO optical properties is focused and discussed. To this aim, a
parametrized equation combining the Drude model, which considers the free-
carrier response at the infrared end, and a double Lorentzian oscillator,
which takes into account the interband transition contribution at the
UV end, is used to model the ITO optical properties in the useful UV-
visible range, whatever the substrate and deposition technique.
Ellipsometric analysis is corroborated by sheet resistance measurements.
© 2002 American Vacuum Society. @DOI: 10.1116/1.1421596#
Tipologia CRIS:
01.01 Articolo in rivista
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