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Relationship between the nanostructures and the optical properties of CeO2 thin films

Academic Article
Publication Date:
2004
abstract:
CeO2 nanostructured thin films have been deposited on Al2O3(1-102) and TiO2(001) single-crystal substrates through metal-organic chemical vapor deposition (MOCVD) using the Ce(III) 1,1,1,5,5,5-hexafluoro-2,4-pentanedionato diglyme adduct (Ce(hfa)(3).diglyme). Structural and morphological characterizations have been carried out by X-ray diffraction pattern (XRD), atomic force microscopy (AFM), and scanning electron microscopy (SEM) measurements. It has been found that the deposition temperature and the lattice mismatch with the substrate have a strong impact on the film nanostructure. X-ray diffraction patterns of samples grown at low deposition temperature point to the formation of <100> oriented CeO2 films, while films deposited at higher deposition temperatures have <111> texture. Furthermore, SEM cross section images clearly point to relevant effects of deposition temperatures both on the structural alignment of CeO2 grains as well as on the film/substrate interfaces. Spectroscopic ellipsometric measurements provide a suitable rationalization of correlations between nanostructures and optical properties of the CeO2 films. Moreover, combination of SEM and spectroscopic ellipsometric measurements provide an in-depth interpretation of growth modes.
Iris type:
01.01 Articolo in rivista
Keywords:
CHEMICAL-VAPOR-DEPOSITION; LOW-TEMPERATURE GROWTH; CERIUM DIOXIDE; BUFFER LAYERS; MOCVD
List of contributors:
Losurdo, Maria; Bruno, Giovanni; LO NIGRO, Raffaella; Toro, ROBERTA GRAZIA
Authors of the University:
LO NIGRO RAFFAELLA
TORO ROBERTA GRAZIA
Handle:
https://iris.cnr.it/handle/20.500.14243/150987
Published in:
JOURNAL OF PHYSICAL CHEMISTRY. B, CONDENSED MATTER, MATERIALS, SURFACES, INTERFACES & BIOPHYSICAL
Journal
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