Modeling of a negative ion source I. Gas kinetics and dynamics in the expansion region

The vibrational population distribution of the electronic ground state of H2 in the expansion region of a negative ion source is investigated using a kinetic Monte Carlo model. Operative conditions are referred to the inductively coupled plasma radio frequency negative ion source developed at IPP-Garching. The different excitation and relaxation processes are discussed, both bulk and surface contributions. In particular, due to the relatively high plasma density, the relevant role of direct low energy electron-impact excitation, surface Auger neutralization, and vibration-translation deactivation are recovered. Results of the present model will be used as input data for the neutral source model in the extraction region.