Publication Date:
2014
abstract:
Diamond powders of various size ranging from few nanometers to tens of micrometers are
commonly used to treat the silicon substrate in order to enhance the nucleation process before
the growth of thin diamond films by chemical vapor deposition (CVD) techniques[1 and refs.
therein]. Recently a great attention is paid to nanodiamond (ND) particles which include stable
nitrogen-vacancy (N-V) color centers [2]. In this work we propose the spray technique [3] to
directly deposit natural ND layers on silicon substrate using particles of 250 nm. ND particles were
dispersed in the apolar solvent 1, 2 - dichloroethano (DCE) by sonication for 30 minutes. Then the
dispersion was sprayed on the Si substrate, obtaining the highest ND density in the middle of it.
The obtained ND films were analyzed by Raman spectroscopy, atomic force microscopy (AFM) and
3D confocal microscopy. The first technique allows the measurement of the chemical and
structural composition and the photoluminescent properties, whereas the other ones measure the
topography and morphology of the layers.
A careful morphological analysis showed the existence of pillar-like self-assembled structures
distributed in an irregular way. The highest pillar density was found far from the center of the
sample, where the ND layer is non-uniform. The evolution of the structures were well observed by
the 3D image analysis performed by confocal microscopy and AFM. The studyon the formation
mechanisms of ND self-assembled structures will be presented and discussed.
Iris type:
04.03 Poster in Atti di convegno
List of contributors: