CaCu3Ti4O12, a novel material for capacitive applications: thin film growth and characterization

Recently a simple and low cost route to produce high quality CaCu 3Ti4O12 (CCTO) films adopting a multi-metal molten single source, consisting of Ti(tmhd)2(i-Opr)2, Ca(hfa)2tetraglyme and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme= 2,5,8,11,14- pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethy1-3,5-heptandione; i-Opr = iso-propoxide] precursor mixture has been realized by Metal-Organic Chemical Vapor Deposition (MOCVD) technique. The CCTO films have been deposited on different substrates, such as (100)LaAlO3 single crystal substrates and Pt conductive electrodes. Film structural characterization has been carried out by X-ray diffraction (XRD), while morphological characteristics and chemical composition have been investigated by Transmission Electron Microscopy (TEM), Scanning Electron Microscopy (SEM) and Energy Dispersive X-Ray (EDX) analysis. The structural and morphological characteristics strongly depend on substrate nature while the chemical composition is almost identical in both cases, thus indicating that no chemical interaction occurs between films and any kind of substrates