Data di Pubblicazione:
2016
Abstract:
Nanoscale dielectric films made of alumina grown by atomic layer deposition (ALD) have been implemented as high-k dielectric material in organic light emitting transistors (OLETs). This leads to the reduction of both the threshold and operating bias regime of the devices while obtaining comparable light emission, when compared to our standard polymer-based dielectric platform.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Alumina thin film; Atomic layer deposition (ALD); Gate oxide; High-k dielectric; Light emitting devices; Organic light emitting transistors (OLETs)
Elenco autori:
Muccini, Michele
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