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Organic light emitting transistors (OLETs) using ALD-grown AL2O3dielectric

Articolo
Data di Pubblicazione:
2016
Abstract:
Nanoscale dielectric films made of alumina grown by atomic layer deposition (ALD) have been implemented as high-k dielectric material in organic light emitting transistors (OLETs). This leads to the reduction of both the threshold and operating bias regime of the devices while obtaining comparable light emission, when compared to our standard polymer-based dielectric platform.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Alumina thin film; Atomic layer deposition (ALD); Gate oxide; High-k dielectric; Light emitting devices; Organic light emitting transistors (OLETs)
Elenco autori:
Muccini, Michele
Autori di Ateneo:
MUCCINI MICHELE
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/373512
Pubblicato in:
DIGEST OF TECHNICAL PAPERS
Journal
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http://www.scopus.com/record/display.url?eid=2-s2.0-85018466785&origin=inward
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