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Organic light emitting transistors (OLETs) using ALD-grown AL2O3dielectric

Academic Article
Publication Date:
2016
abstract:
Nanoscale dielectric films made of alumina grown by atomic layer deposition (ALD) have been implemented as high-k dielectric material in organic light emitting transistors (OLETs). This leads to the reduction of both the threshold and operating bias regime of the devices while obtaining comparable light emission, when compared to our standard polymer-based dielectric platform.
Iris type:
01.01 Articolo in rivista
Keywords:
Alumina thin film; Atomic layer deposition (ALD); Gate oxide; High-k dielectric; Light emitting devices; Organic light emitting transistors (OLETs)
List of contributors:
Muccini, Michele
Authors of the University:
MUCCINI MICHELE
Handle:
https://iris.cnr.it/handle/20.500.14243/373512
Published in:
DIGEST OF TECHNICAL PAPERS
Journal
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http://www.scopus.com/record/display.url?eid=2-s2.0-85018466785&origin=inward
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