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Y2O3 thin films characterized by XPS

Articolo
Data di Pubblicazione:
2001
Abstract:
Y2O3 thin films were synthesized by Chemical Vapor Deposition (CVD) using Y(acac)3.xH2O (Hacac= 2,4-pentanedione) as precursor. This work is focused on the X-ray Photoelectron Spectroscopy (XPS) characterization of an Y2O3 thin film deposited on glass substrate at 450°C in N2+O2 atmosphere and subsequently annealed in air at 1000°C. Besides the wide scan spectrum, charge corrected binding energies for the Y3d5/2, Y3d3/2, O1s and C1s surface photoelectron signals are reported.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
thin films; x-ray photoelectron spectroscopy; yttrium(III) oxide
Elenco autori:
Gerbasi, Rosalba; Barreca, Davide
Autori di Ateneo:
BARRECA DAVIDE
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/25004
Pubblicato in:
SURFACE SCIENCE SPECTRA
Journal
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