Sensing characteristics of nio thin films as NO2 gas sensors

In this paper we present the results concerning the characterisation of
nickel oxide thin films deposited by d.c. reactive magnetron sputtering.
Different NiO thin films have been prepared by changing some deposition
parameters, as the oxygen content in the reactive plasma and the sputtering
mode (metal- or oxide-sputtering mode). The structure and surface
morphology of the samples have been analysed by XRD and by atomic force
microscopy and scanning electron microscope, respectively. The electrical
responses of the NiO films towards NO2 have been also considered. NiO thin
films showed good responses to low NO2 concentrations (1–10 ppm) with a
maximum at 160 °C operating temperature.